Cover of the work “Theoretical study of deep anisotropic etching of silicon structures in low-temperature plasma”. Author: Lukichev, Vladimir Fedorovich. Degree: Doctor of Sciences. Year: 1997

Theoretical study of deep anisotropic etching of silicon structures in low-temperature plasma

Moscow

164 pp.

Theoretical study of deep anisotropic etching of silicon structures in low-temperature plasma — Lukichev, Vladimir Fedorovich — 1997 — Russian Dissertation Library