Cover of the work “Structural and electrophysical properties of amorphous HfxAl1-xOy and ferroelectric HfxLa1-xOy, HfxZr1-xOy thin-film oxides formed by atomic layer deposition”. Author: Chernikova, Anna Georgievna. Degree: Candidate of Sciences. Year: 2016

Structural and electrophysical properties of amorphous HfxAl1-xOy and ferroelectric HfxLa1-xOy, HfxZr1-xOy thin-film oxides formed by atomic layer deposition

Moscow Institute of Physics and Technology (State University), Dolgoprudny

153 pp.

Keywords

thin-film oxides, atomic layer deposition of oxides, complex oxides

Structural and electrophysical properties of amorphous HfxAl1-xOy and ferroelectric HfxLa1-xOy, HfxZr1-xOy thin-film oxides formed by atomic layer deposition — Chernikova, Anna Georgievna — 2016 — Russian Dissertation Library